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Kinetics of disintegration of titanium and zirconium nanofilms deposited onto silicon carbide and aluminium nitride as result  of annealing them in vacuum  

† J.Naydich,
 
I.Gab,
 
T.Stecyuk,
 
B.Kostyuk,
 
S.Martynyuk 
 

I. M. Frantsevich Institute for Problems of Materials Science of the NAS of Ukraine, Omeliana Pritsaka str.,3, Kyiv, 03142, Ukraine
Adhesion of Melts and Brazing of Materials - Kiev: Frantsevich Institute for Problems of Materials Science NASU, 2016, #49
http://www.materials.kiev.ua/article/2332

Abstract

The results of studies kinetics of disintegration of titanium and zirconium nanofilms 100 nm thickness deposited onto substrates surfaces which were made from aluminium nitride and monocrystal of silicon carbide and were annealed in a vacuum at temperatures of 1200—1600° С during different exposure times at each temperature in interval of 2—20 min are given.


ANNEALING, DISINTEGRATION, ITANIUM NANOFILMS, ZIRCONIUM NANOFILMS, KINETICS, SUBSTRATE

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