Formation of a Fe_xSi_yC_z thin layer via PCV deposition of SiCN on a hot steel surface

Анотація

In this work, it has been established that on steel plates heated to 600 °C, an Fe_xSi_yC_z layer forms during plasmachemical vapor deposition of SiCN ceramics. As-a plasma forming agent, hexamethyldisilazane was used in the deposition, from which a SiCN product was formed. The deposited ceramic film is heterogeneous and consists of regions where predominantly FeSi₂ or Fe_xSi_yC_z is present. The thickness of the film is 0.8 μm. An investigation of the degradation of the ceramic film in tap water and a 3% aqueous NaCl solution at 26 and 60 °C demonstrated that FeSi₂ corrodes first, and then Fe_xSi_yC_z corrodes. The process was also analyzed using electrochemical techniques.