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Structure and Properties of NbN and Nb-Si-N Deposited by Magnetron Sputtering

V.Ivaschenko,
 
P.Skrynskyy,
 
O.Lytvyn,
 
V.N.Rogoz,
 
O.V.Sobol,
 
A.P.Kuzmenko
 

I. M. Frantsevich Institute for Problems of Materials Science of the NAS of Ukraine, Omeliana Pritsaka str.,3, Kyiv, 03142, Ukraine
Proceedings of the International Conference “Nanomaterials: Applications and Properties”, Lviv, Ukraine, September 21-23, 2014, 2014, Т.3, #1
http://www.materials.kiev.ua/article/1646

Abstract

NbN and Nb-Si-N films were deposited by magnetron sputtering the Nb and Si targets on silicon wafers at various bias voltage, Us. The films were investigated by an atomic force microscope (AFM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and nanoindentation. The deposited films were annealed to establish their thermal stability. The NbN films were nanostructured, and the Nb-Si-N films had a nanocomposite structure, and represented an aggregation of δ-NbNx nanocrystallites embedded into the amorphous Si3N4 tissue (nc-δ-NbNx / a-Si3N4).


AFM, NB-SI-N, NBN, XPS, XRD

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