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  5. Onoprienko A.
  6. Article

Production of Ti-Al-Si-B-N films by magnetron sputtering and study of their mechanical properties

A.Onoprienko,
 
V.Ivaschenko,
 
I.Podchernyaeva,
 
O.Khyzhun,
 
I.Timofeeva,
 
O.Butenko
 

I. M. Frantsevich Institute for Problems of Materials Science of the NAS of Ukraine, Omeliana Pritsaka str.,3, Kyiv, 03142, Ukraine
Powder Metallurgy and Metal Ceramics, 2016, Т.53, #5-6
http://www.materials.kiev.ua/article/1642

Abstract

The Ti–Al–Si–B–N films are deposited by dc magnetron sputtering of a composite Ti–Al–Si–B–N target in argon plasma. The structure and phase composition of the films were studied by X-ray diffraction. The chemical bonds in films were examined by X-ray photoelectron spectroscopy. The influence of vacuum annealing on film structure, hardness, and mechanical properties was analyzed. The films deposited at temperatures in the range 200–500°C and bias voltages of 0…–250 exhibited amorphous structure, which was preserved during annealing up to 800°C. At higher annealing temperatures, nanocrystalline phases started to form in the films. Annealing also resulted in increase of hardness and improvement of mechanical characteristics of the films.


MAGNETRON SPUTTERING, MECHANICAL CHARACTERISTICS, MECHANICAL PROPERTIES

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